Method for adjusting a resistance value of a film resistor

A method of adjusting a resistance value of a film resistor which includes a plurality of linear conductive films formed in parallel on a substrate, and a resistive film formed over portions of the plurality of linear conductive films in a width direction of the linear conductive films, wherein an electric contact is slid over the plurality of linear conductive films to change a detected resistance value, the method comprising the steps of:

• defining, as a single resistive element, a portion of the resistive film formed over a first linear conductive film formed at a position at which a first resistance value is detected when the electric contact is slid thereto, and a second linear conductive film formed at a position at which a second resistance value is detected when the electric contact is slid thereto, wherein a plurality of the linear conductive films are interposed between the first and second linear conductive films;
• trimming a portion of the resistive element at opposite sides of the first linear conductive film in a longitudinal direction substantially perpendicular to the width direction to form first and second trimmed portions;
• and
• trimming a portion of the resistive element from an end of the second trimmed portion in the width direction toward the second linear conductive film to form a third trimmed portion.