Guard filter methodology and automation system to avoid scrap due to reticle errors
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorCheng-I Chen
Life of this patent
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Abstract
A guard filter methodology that automatically controls mask screening with the result of improved wafer quality, less scrap, and improved productivity. Upon each assignment of the mask or reticle to a specific piece of equipment, it provides a trigger to automatically check pertinent aspects of a mask related to wafer quality and yield with a guard filter system in combination with a database. The system is integrated into the current manufacturing machine control system and performs its checks quickly and efficiently. Wafer scrap due to the use of wrong scale mask for the specified equipment or a mask that is not usable are avoided. This automated guard filter methodology reduces manufacturing time and cost, checking frequency, and human error.
Claims32
A method to automatically control mask screening to improve wafer quality, comprising:
- a. assigning said mask to equipment;
- b. providing a database to store said mask's parameters;
- c. defining automatic checking criteria for said mask's parameters for comparison in said database;
- d. providing an automatic trigger function to begin said automatic checking, and
- e. loading of said mask into said equipment only when the set of parameter checks are satisfactorily met.
A system to automatically control mask screening to improve wafer quality, comprising of:
- a. a means to assign said mask to equipment;
- b. a means to provide a database to store said mask's parameters;
- c. a means to define automatic checking criteria for said mask's parameters for comparison in said database;
- d. a means to provide an automatic trigger function to begin said automatic checking, and
- e. a means to control the loading of said mask into said equipment only when the set of parameter checks are satisfactorily met.
Dependencies are inferred from the claim text.