Negative resist composition

A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) shown below, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) shown below, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound

• wherein A represents a hydrogen atom, an alkyl group, a halogen atom or a cyano group;
• and R1 and R2 each independently represent a hydrogen atom, a halogen atom, a hydroxy group, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an alkylcarbonyloxy group or an alkylsulfonyloxy group, or R1 and R2 may be combined with each other to form a ring
• wherein, A, R1 and R2 have the same meanings as A, R1 and R2 defined in formula (1) respectively, provided that the alkali-soluble resin (A-2) has the structure different from that of the alkali-soluble resin (A-1).