Semiconductor processor with wafer face protection
AssigneeSemitool, Inc.
InventorsMartin C. Bleck, Timothy J. Reardon, Eric J. Bergman
Life of this patent
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Abstract
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.
Claims7
An apparatus for processing a semiconductor workpiece having a front face and a back face, comprising:
- a bowl configured to contain a processing fluid for processing the front face of the workpiece;
- and
- a processing head over the bowl, the processing head being configured to hold the front face of the workpiece downward to face the bowl, and the processing head comprising
- a member configured to contact the back face of the workpiece, the member including at least one vacuum opening coupleable to a vacuum source and positioned to draw the workpiece against the member, and
- a seal configured to contact a peripheral portion of the workpiece, and inhibits the processing fluid from contacting at least the peripheral portion of the workpiece.
Dependencies are inferred from the claim text.