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US 6,746,239 B2Granted
Substrate feed chamber and substrate processing apparatus
AssigneeAnelva Corporation
InventorNobuyuki Takahashi
Life of this patent
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AssigneeAnelva Corporation
InventorNobuyuki Takahashi
Estimating the term…
A substrate feed chamber that is equipped in a substrate processing apparatus is provided. The substrate feed chamber has a storage tray capable of storing simultaneously three or more substrate holding trays that hold substrates in a vertical or substantially vertical condition and a horizontal movement mechanism that moves horizontally the storage tray with respect to the substrate feed position in order to effect feeding-in or feeding-out movement of the substrate holding tray between any of the chambers of a group consisting of processing chambers and load lock chambers and, in addition, if required, has a rotary movement device that rotates the storage tray. Improvement in throughput in a substrate processing apparatus can thereby be achieved and increase in the ground-contacting area of the device as a whole can be prevented.
A substrate feed chamber comprising:
A substrate feed chamber comprising:
Dependencies are inferred from the claim text.
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From the US filing history. Foreign family members aren’t listed.
Into and out of processing chamber: mechanical parts of transfer devices
Into and out of processing chamber: characterised by movements or sequence of movements of transfer devices
Material or article handling: associated with semiconductor wafer handling
Generic processes or apparatus for the manufacture or treatment of devices covered
Term ended 24 Sep 2022 (estimated)
1. Field of the Invention
The present invention relates to a substrate feed chamber and substrate processing apparatus suitable for use in manufacturing display devices such as liquid-crystal displays.
2. Description of Related Art
The foregoing and other objects, features and advantages of the present invention will be better understood from the following description taken in connection with accompanying drawings, in which:
FIG. 1A is a diagrammatic plan view of an example of the construction of a substrate processing apparatus according to a first embodiment of the present invention;
FIG. 1B is a diagrammatic plan view given in explanation of a substrate feed chamber according to a first embodiment of the present invention;
Embodiments of the present invention are described below with reference to the drawings. It should be noted that the drawings merely illustrate diagrammatically the size of the structural components and their arrangement relationships to an extent such as to enable the invention to be understood; the present invention is therefore not restricted solely to the illustrated examples. Also, in the drawings employed in the description, identical structural components are given the same reference symbols and repeated description thereof may be omitted.
First Embodiment
FIGS. 1A and 1B are views illustrating diagrammatically an example of the construction of a first substrate processing apparatus 10 according to the present invention. FIG. 1A is a diagrammatic plan view of a first substrate processing apparatus 10 while FIG. 1B is a diagrammatic plan view given in explanation of substrate feed chamber 12 shown in FIG. 1A.