Method of and apparatus for cleaning substrate
AssigneeEbara Corporation
InventorsIchiro Katakabe, Shinya Morisawa, Haruko Ohno, Sachiko Kihara, Akira Fukunaga
Life of this patent
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Abstract
An apparatus continuously supplies an acid solution to a central portion of a surface of a substrate while the substrate is rotating, and also supplies an oxidizing agent solution continuously or intermittently to a periphery of the substrate. In addition, the apparatus supplies an oxidizing agent solution and an acid solution either simultaneously or alternately to a reverse side of the substrate.
Claims28
An apparatus for removing a deposited metal from a peripheral portion of a surface of a substrate, comprising:
- a substrate holder for holding and rotating a substrate about an axis passing through the substrate;
- a first solution supplier for ejecting therefrom an oxidizing agent solution only to a peripheral portion of a surface of the substrate;
- and
- a second solution supplier for ejecting therefrom a non-oxidizing acid solution to a central portion of the surface of the substrate such that, in response to rotation of the substrate about the axis passing therethrough, the non-oxidizing acid solution spreads from the central portion of the surface of the substrate to the peripheral portion of the surface of the substrate.
An apparatus for plating a metal onto a surface of a substrate and removing a portion of the metal from a peripheral portion of the surface of the substrate, comprising:
- a plating unit for depositing a metal onto a surface of a substrate;
- a cleaning unit including
- (i) a substrate holder for holding and rotating the substrate about an axis passing through the substrate,
- (ii) a first solution supplier for supplying an oxidizing agent solution only to a peripheral portion of the plated surface of the substrate, and
- (iii) a second solution supplier for supplying a non-oxidizing acid solution to a central portion of the plated surface of the substrate such that, in response to rotation of the substrate about the axis passing therethrough, the non-oxidizing acid solution spreads from the central portion of the plated surface of the substrate to the peripheral portion of the plated surface of the substrate;
- and
- a transfer device for transferring the plated substrate from said plating unit to said cleaning unit.
An apparatus for removing a deposited meal from a peripheral portion of a surface of a substrate, comprising:
- first means for rotating a substrate about an axis passing through the substrate;
- second means for supplying an oxidizing agent solution only to a peripheral portion of a surface of the substrate;
- and
- third means for supplying a non-oxidizing acid solution to a central portion of the surface of the of the substrate such that, in response to rotation of the substrate about the axis passing therethrough, the non-oxidizing acid solution spreads from the central portion of the surface of the substrate to the peripheral portion of the surface of the substrate.
Dependencies are inferred from the claim text.