Method and system to process semiconductor wafers

A process tool for processing one or more wafers supplied, comprising:

• at least one reaction chamber for subjecting the one or more wafers to a process;
• a tool controller having a processor and memory and operable to execute a process control system program, the process control system program operable to monitor and control tool parameters;
• and
• wherein the tool controller is operable to generate an inhibit next load flag upon predefined inputs and, when the inhibit next load object is generated prior to the start of the processing of a to be processed wafer, prohibit the start of the processing of the to be processed wafer in the reaction chamber, and to provide pre-programmed recovery procedures such that after execution of a preprogrammed recovery procedure the to be processed wafer ends in a defined state such that the tool can be used for further processing.

A method for the batch-wise processing of wafers in a process tool comprising:

• subjecting wafers batch-wise to a process in a reaction chamber in the process tool;
• performing one or more of the following steps in a control computer coupled to the process tool:
• a) setting an inhibit next load flag on predefined conditions, the inhibit next load flag not effecting the processing of a wafer batch of which the processing has already started;
• c) checking, prior to the start of the processing of a to be processed wafer batch, to see if an inhibit-next load flag has been set;
• d) prohibiting to start processing, in the reaction chamber, of the to be processed wafer batch, if an inhibit next load flag has been set;
• and
• e) providing pre-programmed recovery procedures, such that after execution of a pre-programmed recovery procedure the to be processed wafer batch of which the start of the processing is prohibited ends in a defined state such that the process tool can be used for further processing.

A process tool for the batch-wise processing of wafers, comprising:

• at least one reaction chamber for processing batches of wafers;
• a tool controller having a processor and memory and operable to execute a process control system program, the process control system program operable to monitor and control tool parameters;
• and
• wherein the tool controller is operable to generate an inhibit next load object upon predefined inputs and, when the inhibit next load object is generated prior to the start of the processing of a to be processed batch of wafers, to prohibit the start of the processing of the to be processed batch of wafers, and to provide pre-programmed recovery procedures so that after execution of a pre-programmed recovery procedure the to be processed batch of wafers ends in a defined state such that the tool can be used for further processing.

A method for the processing of one or more wafers in a process tool comprising:

• subjecting the one or more wafers in a reaction chamber to a process;
• providing a software implemented “confirmation flag”;
• as a default, setting the confirmation flag in a “false” state for the one or more to be processed wafers;
• examining in a wafer inspection tool a wafer previously processed in said reaction chamber and comparing the results against acceptance criteria;
• setting the confirmation flag to a “true” state if the results are within the acceptance criteria and setting or leaving said confirmation flag to a “false” state when the results are outside the acceptance criteria;
• checking, prior to the start of the processing of one or more to be processed wafers, to see if the confirmation flag is in a “true” state;
• prohibiting the start of the processing of the one or more to be processed wafers if the confirmation flag is in a “false” state.

A process tool for the processing of one or more wafers comprising:

• at least one reactor chamber for processing one or more wafers;
• a system controller having a processor and memory and operable to execute a process control system program and to monitor and control processing tool parameters;
• and
• a wafer inspection station coupled to the processing tool and coupled to the system controller, the wafer inspection station operable to examine a wafer previously processed in the reaction chamber, the wafer inspection station to generate wafer data and send the wafer data to the system controller;
• and
• wherein the system controller is operable to compare the wafer data against predefined limits and set a confirmation flag in a “true” state when the wafer data are within the predefined limits and set or leave the confirmation flag in a “false” state when the wafer data are outside the predefined limits and to prohibit the start of the processing of the one or more to be processed wafers when the confirmation flag is in a false state.