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AssigneeASML Netherlands B.V.
InventorsWillem Van Schaik, Antonie Ellert Duisterwinkel, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
Estimating the term…
In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
A lithographic projection apparatus comprising:
A device manufacturing method comprising:
A cleaning unit for cleaning contaminated objects comprising a space, a radiation source for supplying and directing into said space radiation having wavelengths of 250 nm or less and a gas supply for supplying a purge gas into said space, wherein said purge gas comprises an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons and wherein the total amount of oxygen-containing species present in said purge gas is from 1 ppb to 10 ppm by volume.
A method of cleaning contaminated objects comprising:
Dependencies are inferred from the claim text.