Quantum conductive barrier for contact to shallow diffusion region

Abstract

Structures such as source/drain contacts of improved reliability are enabled by the creation and use of quantum conductive barrier layers at the interface between the electrical contact and the shallow diffusion source/drain region. The quantum conductive layers are preferably nitrides or oxynitrides. The improved structure is preferably part of a transistor structure of an integrated circuit device. The contacts structures are especially useful for devices employing ultra-shallow junctions.

Dependencies are inferred from the claim text.