Bipolar MOSFET device

An insulated gate bipolar transistor type semiconductor device comprising:

• at least one cell comprising a base region of a first conductivity type having disposed therein at least one emitter region of a second conductivity type;
• a first well region of a second conductivity type;
• a second well region of a first conductivity type;
• a drift region of a second conductivity type;
• a collector region of a first conductivity type;
• a collector contact;
• wherein each cell is disposed within the first well region and the first well region is disposed within the second well region;
• the device further comprising:
• a first gate disposed over a base region so that a MOSFET channel can be formed between an emitter region and the first well region;
• the device further comprising:
• a second gate disposed over the second well region so that a MOSFET channel can be formed between the first well region and the drift region;
• wherein the device is configured such that during operation of the device a depletion region at a junction between the base region and the first well region can extend to a junction between the first well region and the second well region, thereby substantially isolating the potential of the first well region from any increase in the potential of the collector contact so that the device can be turned off without having to form a MOSFET channel between the base region and the second well region;
• and
• wherein an on-state conduction proceeds through a thyristor comprising at least said first well region, said second well region, said drift region, and said collector region.

An emitter switched thyristor semiconductor device comprising:

• at least one cell comprising a base region of a first conductivity type having disposed therein at least one emitter region of a second conductivity type;
• a first well region of a second conductivity type;
• a second well region of a first conductivity type;
• a drift region of a second conductivity type;
• a collector region of a first conductivity type;
• a collector contact;
• and
• a heavily doped isolation region of said first conductivity type which is in contact with said second well region and in direction electrical contact with at least said base region and at least said emitter region;
• wherein each cell is disposed within the first well region and the first well region is disposed within the second well region;
• the device further comprising:
• a first gate disposed over a base region so that a MOSFET channel can be formed between the first well region and the drift region;
• and
• wherein the device is configured such that during operation of the device a depletion region at a junction between the base region and the first well region can extend to a junction between the first well region and the second well region, thereby substantially isolating the potential of the first well region from any increase in the potential of the collector contact so that the device can be turned off without having to form a MOSFET channel between the base region and the second well region.

An insulated base emitter switched thyristor type semiconductor device comprising:

• at least one cell comprising a base region of a first conductivity type having disposed therein at least one emitter region of a second conductivity type;
• a first well region of a second conductivity type;
• a second well region of a first conductivity type;
• a drift region of a second conductivity type;
• a collector region of a first conductivity type;
• a collector contact;
• a heavily doped isolation region of said first conductivity type which is in contact with said second well region and in direction electrical contact with at least said base region and at least said emitter region;
• wherein each cell is disposed within the first well region and the first well region is disposed within the second well region;
• the device further comprising:
• a first gate disposed over a base region so that a MOSFET channel can be formed between the first well region and the drift region;
• and
• wherein the device is configured such that during operation of the device a depletion region at a junction between the base region and the first well region can extend to a junction between the first well region and the second well region, thereby substantially isolating the potential of the first well region from any increase in the potential of the collector contact so that the device can be turned off without having to form a MOSFET channel between the base region and the second well region.

A method of operating a semiconductor device comprising the steps of:

• providing a semiconducting device comprising:
• at least one cell comprising a base region of a first conductivity type having disposed therein at least one emitter region of a second conductivity type;
• a first well region of a second conductivity type;
• a second well region of a first conductivity type;
• a drift region of a second conductivity type;
• a collector region of a first conductivity type;
• and
• a collector contact;
• in which each cell is disposed within the first well region and the first well region is disposed within the second well region;
• the device further comprising:
• a first gate disposed over a base region so that a MOSFET channel can be formed between an emitter region and the first well region;
• the device further comprising:
• a second gate disposed over the second well region so that a MOSFET channel can be formed between the first well region and the drift region;
• forming the MOSFET channel between the emitter region and the first well region;
• forming the MOSFET channel between the first well region and the drift region;
• and
• operating the device so that a depletion region is formed at a junction between the base region and the first well region which extends to a junction between the first well region and the second well region, thereby substantially isolating the potential of the first well region from any increase in the potential of the collector contact;
• turning off the device without forming a MOSFET channel between the base region and the second well region.