Substrate defect inspection method and substrate defect inspection system

A substrate defect inspection method, comprising:

• detecting a substrate defect position by the use of defect detection equipment, and sending information including the defect position to defect observation equipment;
• setting a plurality of measurement points on said substrate, and measuring an amount of shift in position of each of said measurement points between the coordinate system of said defect detection equipment and the coordinate system of said defect observation equipment;
• creating a defect position correction formula, having terms for the offset component and the rotation component of the coordinate system of said defect observation equipment with respect to the coordinate system of said defect detection equipment, based on the amount of position shift for each of said measurement points;
• correcting said defect position detected by said defect detection equipment using said defect position correction formula;
• and
• generating an image of said corrected defect position by the scanning electron microscope of said defect observation equipment, and inspecting the defect based on said image data.

A substrate defect inspection system, comprising defect detection equipment which detects substrate defect positions and defect observation equipment which observes defects detected by said defect detection equipment using a scanning electron microscope and performs defect inspections, wherein said defect observation equipment comprises:

• position shift measurement means, which sets a plurality of measurement points on said substrate, and measures an amount of position shift of each of said measurement points between the coordinate system of said defect detection equipment and the coordinate system of said defect observation equipment;
• correction formula creation means, which creates a defect position correction formula having terms for the offset component and the magnification component of the coordinate system of said defect observation equipment with respect to the coordinate system of said defect detection equipment, based on the amount of position shift of each of said measurement points;
• position correction means, which corrects said defect position detected by said defect detection equipment, using said defect position correction formula;
• and
• means for generating an image of said corrected defect position using said scanning electron microscope, and inspecting the defect based on the image data.

A substrate defect inspection system, comprising defect detection equipment which detects substrate defect positions and defect observation equipment which observes defects detected by said defect detection equipment using a scanning electron microscope and performs defect inspections, wherein said defect observation equipment comprises:

• position shift measurement means, which sets a plurality of measurement points on said substrate, and measures an amount of position shift of each of said measurement points between the coordinate system of said defect detection equipment and the coordinate system of said defect observation equipment;
• correction formula creation means, which creates a defect position correction formula having terms for the offset component and the rotation component of the coordinate system of said defect observation equipment with respect to the coordinate system of said defect detection equipment, based on the position shift amount of each of said measurement points;
• position correction means, which corrects said defect position detected by said defect detection equipment, using said defect position correction formula;
• and
• means which generates an image of said corrected defect position using said scanning electron microscope, and which inspects the defect based on the image data.