Faraday system for ion implanters

A method for measuring ion current in an ion beam treatment system, comprising steps of:

• providing a Faraday cup body which defines a chamber, said chamber having an entrance aperture and a defined chamber depth for receiving an ion beam wherein an aspect ratio of said chamber depth and said entrance aperture is less than approximately 1.0;
• positioning a suppression electrode in proximity to the entrance aperture to produce electric fields for inhibiting escape of electrons from said chamber;
• and
• positioning a magnet assembly to produce magnetic fields for inhibiting escape of electrons from said chamber.

A Faraday system for use in an ion beam treatment system, comprising:

• a Faraday cup body defining a chamber, said chamber having an entrance aperture for receiving an ion beam;
• a suppression electrode positioned in proximity to the entrance aperture to produce electric fields for inhibiting escape of electrons from said chamber wherein said suppression electrode comprises a suppression ring disposed around said entrance aperture and wherein said suppression electrode has an aperture and said suppression ring is tapered toward the aperture in said suppression ring;
• and
• a magnet assembly positioned to produce magnetic fields for inhibiting escape of electrons from said chamber.

A method for measuring ion current in an ion beam treatment system, comprising steps of:

• providing a Faraday cup body which defines a chamber, said chamber having an entrance aperture for receiving an ion beam;
• positioning a suppression electrode in proximity to the entrance aperture to produce electric fields for inhibiting escape of electrons from said chamber wherein said suppression electrode comprises a suppression ring disposed around said entrance aperture and wherein said suppression ring has an aperture and said suppression ring is tapered toward the aperture in said suppression ring;
• and
• positioning a magnet assembly to produce magnetic fields for inhibiting escape of electrons from said chamber.