Lithographic projection apparatus

A device manufacturing method comprising:

• (a) providing a mask table with a substrate which contains a pattern,
• (b) providing a substrate table with a substrate which is at least partially covered by a layer of radiation-sensitive material,
• (c) prior to (b), providing the substrate to an intermediate table comprising a major surface provided with a plurality of aperatures, and maintaining the substrate for a given time interval upon a gas bearing generated between the major surface and the substrate;
• and
• (d) using a projection beam of radiation to project an irradiated part of the mask onto a target area of the layer of radiation-sensitive material.

A substrate preparing device comprising an intermediate table on which a substrate can be positioned before transfer to a substrate table in a lithographic projection apparatus;

• the intermediate able comprising a major surface provided with a plurality of aperatures, and a gas bearing generator constructed and arranged to generate a gas bearing between said major surface and a substrate located thereon;
• a first temperature controller constructed and arranged to regulate a temperature of the intermediate table;
• and
• an ionizer constructed and arranged to ionize the gas.

A substrate preparing device comprising:

• an intermediate table on which a substrate can be positioned before transfer to a substrate table in a lithographic projection apparatus, the intermediate table comprising a major surface provided with a plurality of apertures;
• a gas bearing generator constructed and arranged to generate a gas bearing between said major surface and a substrate located thereon;
• and
• a temperature controller constructed and arranged to regulate a temperature of at least one of the intermediate table and the temperature of the gas.