Exposure apparatus and exposure method
AssigneeNikon Corporation
InventorKenichirou Kaneko
Life of this patent
Estimating the term…
Abstract
A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the substrate is mounted. The substrate stage together with the substrate is movable when the substrate is being exposed to the pattern image. A memory stores pattern image distortion information generated in accordance with an exposure position on the substrate when the pattern image is being transferred onto the substrate. A compensator compensates for the distortion so that the pattern is formed cleanly on the substrate.
Claims16
An exposure apparatus for projecting a pattern image of a pattern formed on a mask onto a plurality of shot areas on a substrate, comprising:
- a substrate stage on which the substrate is mounted and which is movable together with the substrate when each of the shot areas is exposed;
- and
- a memory device that stores plural pieces of distortion information of the pattern image generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural pieces of distortion information are stored to correspond with each of the shot areas in advance.
An exposure apparatus for projecting a pattern image of a pattern formed on a mask onto a plurality of shot areas on the substrate, comprising:
- a substrate stage on which the substrate is mounted and which is movable together with the substrate when each of the shot areas is exposed;
- and
- a compensator that compensates for distortion of the pattern image based on plural pieces of distortion information of the pattern image which are generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural pieces of distortion information correspond to each of the shot areas.
An exposure method for projecting a pattern image of a pattern formed on a mask onto a plurality of shot areas on a substrate, comprising the steps of:
- obtaining plural pieces of distortion information of the pattern image generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural piecs of distortion information correspond to each of the shot areas;
- and
- compensating for distortion of the pattern image based on the plural pieces of distortion information and exposing each of the shot areas.
A method for fabricating an exposure apparatus that projects a pattern image of a pattern formed on a mask onto a plurality of shot areas on a substrate, comprising the steps of:
- providing a substrate stage on which the substrate is mounted and which is movable together with the substrate when each of the shot areas is exposed;
- and
- providing a memory device that stores plural pieces of distortion information of the pattern image of the pattern image generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural pieces of distortion information are stored to correspond to each of the shot areas in advance.
A method for fabricating an exposure apparatus that projects a pattern image of a pattern formed on a mask onto a plurality of shot areas on a substrate, comprising the steps of:
- providing a substrate stage on which the substrate is mounted and which is movable together with the substrate when each of the shot areas is exposed;
- and
- providing a compensator that compensates for the distortion of the pattern image based on plural pieces of distortion information of the pattern image w hich are generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural pieces of distortion information correspond to each of the shot areas.
A method for fabricating a device by performing an exposure process that proiects a pattern image of a pattern formed on a mask onto a plurality of shot areas on a substrate, comprising the steps of:
- obtaining plural pieces of distortion information of the pattern image generated in accordance with a position of each of the shot areas on the substrate when the pattern image is being transferred onto each of the shot areas, wherein the plural pieces of distortion information correspond to each of the shot areas,
- substrate compensating for distortion of the pattern image based on the plural pieces of distortion information and exposing each of the shot areas;
- and
- assembling the device using the exposed substrate.
Dependencies are inferred from the claim text.