Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwards

A method for anisotropically etching a substrate using a device for etching the substrate with a plasma, comprising the steps of:

• causing a plasma source to generate a high-frequency electromagnetic alternating field, a high-frequency generator being adapted to apply a high-frequency power to the plasma source;
• causing a reactor to generate the plasma from reactive particles through an action of the high-frequency electromagnetic alternating field upon one of a reactive gas and a reactive gas mixture;
• causing a first arrangement to produce a periodical change in the high-frequency power applied to the plasma source by one of:
• operating a component for controlling a power of the high-frequency generator via a software-programmed digital ramp generator, and
• operating a component including an analog ramp generator and for controlling the power of the high-frequency generator,
• carrying out the anisotropic etching process in separate etching and polymerization steps alternatingly following each other;
• and
• applying a polymer to lateral patterns defined by an etching mask during the polymerization steps, the polymer being removed again in each case during the subsequent etching steps;
• wherein, during the etching steps, at least temporarily, and in each case higher high-frequency power is applied to the plasma source than during the deposition steps.

A device for etching a substrate with a plasma, comprising:

• a plasma source adapted to generate a high-frequency electromagnetic alternating field;
• a high-frequency generator adapted to apply a high-frequency power to the plasma source;
• a reactor adapted to generate the plasma from reactive particles by the high-frequency electromagnetic alternating field acting on one of a reactive gas and a reactive gas mixture;
• and
• a first arrangement adapted to produce a periodical change in the high-frequency power applied to the plasma source, the first arrangement being a component for controlling a power of the high-frequency generator, the component including one of a digital ramp generator programmed via a software and an analog ramp generator.