US 6,720,128 B2Granted

Positive resist composition

AssigneeFuji Photo Film Co., Ltd.

InventorsYutaka Adegawa, Toshiaki Aoai, Ippei Nakamura

Life of this patent

Estimating the term…

Abstract

A positive resist composition comprises: a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray; or a cyclic ether compound.

Claims12

Dependent claims

A positive chemical amplification resist composition which comprises (a) a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray.

Dependencies are inferred from the claim text.

Facts

Application: 10/062,497Filed 5 Feb 2002
Priority: JP P. 2001-0283365 Feb 2001
Published: US 2003/0039916 A127 Feb 2003
Granted: 13 Apr 2004
Term ends: Not estimatedThe source records don’t support an estimate.

Classification8 codes

G03F 7/0392
Macromolecular compounds which are photodegradable, e.g. positive electron resists: the macromolecular compound being present in a chemically…
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/0395
The macromolecular compound being present in a chemically amplified positive photoresist composition: the macromolecular compound having a…
G03F 7/0397
The macromolecular compound being present in a chemically amplified positive photoresist composition: the macromolecular compound having an…

Family

US 2003/0039916 A1Pre-grant publication · published 27 Feb 2003
US 6,720,128 B2This patent

From the US filing history. Foreign family members aren’t listed.

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