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US 6,720,118 B2Granted
Enhanced inspection of extreme ultraviolet mask
AssigneeIntel Corporation
InventorsPei-Yang Yan, Ted Liang, Guojing Zhang
Life of this patent
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Abstract
The present invention discloses a method of increasing the contrast of an EUV mask at inspection by forming a multilayer mirror over a substrate; forming an absorber layer over the multilayer mirror; forming a top layer over the absorber layer; patterning the mask into a first region and a second region; and removing the top layer and the absorber layer in the first region.
Claims18
A mask comprising:
- a substrate;
- a multilayer mirror disposed over said substrate, said multilayer mirror having a first region and a second region;
- an absorber layer disposed over said second region of said multilayer mirror, said absorber layer being absorbent at a first wavelength;
- and
- a top layer disposed over said absorber layer, said top layer being absorbent at a second wavelength.
2 more elements
Dependencies are inferred from the claim text.