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US 6,720,117 B2Granted
Exposure mask with appended mask error data
OwnerShunichi Matsumoto, Yasuhiro Yoshitake +2inventors
InventorsShunichi Matsumoto, Yasuhiro Yoshitake, Takeshi Kato, Norio Hasegawa
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Abstract
An exposure mask includes an optically transparent substrate, a device area constituted with a pattern formed on the substrate, and alignment marks formed on the substrate. Further measurement data for relative positional displacement between the device area and the alignment marks on the substrate is appended together with information for identifying the substrate to the substrate.
Claims17
An exposure mask comprising:
- an optically transparent substrate;
- a device area constituted with an exposure circuit pattern on the substrate;
- and
- mask alignment marks formed on the substrate for use in positioning the exposure mask in a mask coordinate system;
- wherein mask error data representing an error positional displacement of a position of the device area relative to the mask alignment marks, for use in corrective optimal alignment of the device area on a basis of a position of the mask alignment marks, is appended together with information identifying the exposure mask.
2 more elements
An exposure mask comprising:
- an optically transparent substrate;
- a device area constituted with a light exposure circuit pattern on the substrate;
- a pair of mask alignment marks formed on the substrate for positioning the exposure mask in a mask coordinate system;
- and
- measurement marks formed on at least four positions on the substrate so as to define predetermined positions of the device area;
- wherein mask error data representing an error positional displacement of a position of the device area relative to the mask alignment marks, for use in corrective optimal alignment of the device area on a basis of a position of the mask alignment marks, is appended together with information identifying the exposure mask.
3 more elements
An exposure mask comprising:
- an optically transparent substrate;
- a device area constituted with a light exposure circuit pattern on a the substrate;
- a pair of mask alignment marks formed outside of the device area on the substrate for positioning the exposure mask in a mask coordinate system;
- and
- measurement marks disposed on at least four positions adjacent to a boundary region of the device area on the substrate, so as to define predetermined positions of the device area;
- wherein mask error data representing an error positional displacement of a position of the device area relative to the mask alignment marks, for use in corrective optimal alignment of the device area on a basis of a position of the mask alignment marks, is appended together with information identifying the exposure mask.
3 more elements
Dependencies are inferred from the claim text.