Three dimensional reconstruction metrology

A method of characterizing comprising:

• obtaining a first data set of localized information corresponding to a first feature on a first surface;
• using height information related to the first feature to develop a transform function that positions the first data set of localized information relative to the first surface;
• and
• applying the transform function to a second data set of localized information corresponding to a second feature along a second surface to develop topographic information related to the second feature.

A method of characterizing a feature positioned along a plane comprising:

• providing a first image representative of a first feature surface based on multiple scan lines of data, each scan line comprising an ordered array of data values, the first image containing topographical information represented by an intensity matrix I(x,y);
• producing a weighted average among corresponding values in different arrays for multiple scan lines of data representative of a first area along the feature surface to produce a weighted average array of data;
• obtaining height vector information H1(x) separate from the first image representing a portion of the first feature surface relative to a plane;
• applying the height vector information to the weighted average array of data to create a transform function F(x) operable to define additional topographic information.

A method of characterizing comprising:

• scanning a feature on a surface of a substrate to produce a top down image containing topographical information represented by an intensity matrix I1(x,y);
• producing a function P(x) representative of a first area of the surface of substrate as a function of I1(x,y);
• and
• developing a multiple parameter characterization MPC P(x) of the function P(x) by:
• defining a reference axis in relation to the function P(x);
• and
• measuring space and width dimensions of the function P(x) from the reference axis as a function of height of the feature.

A method comprising:

• obtaining a first data set of information I1(x,y) related to a surface feature of a first semiconductor wafer using one of a scanning electron microscope, a focused ion beam microscope, a focused x-ray microscope and a focused optical microscope;
• obtaining a second data set of information H1(x) related to the surface feature of the first semiconductor wafer with one of the group of an atomic force microscope, a scanning probe microscope, an ellipsometer, a stylus nanoprofilometer, a scatterometer, and a destructive test;
• developing a transform function F(x) which correlates the first data set of information I1(x,y) to the second data set of information H1(x);
• obtaining a third data set of information IN(x,y) related to a surface feature of a second semiconductor wafer using the one of a scanning electron microscope, a focused ion beam microscope, a focused x-ray microscope and a focused optical microscope;
• and
• applying the transform function F(x) to the third data set of information IN(x,y) to develop data representing a three dimensional shape corresponding to the surface feature of the second semiconductor wafer.

An apparatus for characterizing a surface of a specimen, the apparatus comprising:

• a means for nondestructively examining a surface of a specimen and for producing topographic information represented by an intensity matrix I(x,y) across the surface of the specimen;
• a waveform generator adapted for producing a function P(x) representing a localized area of the surface of the specimen as a function of I(x,y);
• a means for nondestructively examining the surface of the specimen and for producing topographic information represented by a height vector H(x);
• and
• a function generator having the function P(x) and the height vector H(x) as inputs and operable to produce a transform function F(x) for transforming P(x) to H(x).

A system for characterizing a surface of a specimen, the system comprising:

• a scanning electron microscope device adapted for nondestructively examining a surface of a specimen and for producing topographic information represented by an intensity matrix I(x,y) across the surface of the specimen;
• a waveform generator adapted for producing a function P(x) representing a localized area of the surface of the specimen as a function of I(x,y);
• one of a scatterometer and a scanning probe microscope adapted for nondestructively examining the surface of the specimen and for producing topographic information represented by a height vector H(x);
• and
• a function generator having the function P(x) and the height vector H(x) as inputs and operable to produce a transform function F(x) for transforming P(x) to H(x).