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US 6,713,747 B2Granted
Light exposure apparatus
AssigneeNikon Corporation
InventorAkikazu Tanimoto
Life of this patent
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Abstract
A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.
Claims12
A scanning exposure apparatus in which a substrate is exposed with an image of a pattern formed on a mask while the mask and the substrate are moved synchronously in respective scanning directions relative to exposure light, the apparatus comprising:
- a light source;
- an illumination system;
- and
- an optical member having two edges which are arranged apart from a plane conjugate with a pattern surface of the mask in the illumination system, and which define a width of an illumination region of the exposure light, wherein a distance between at least one of the edges of the optical member and the plane is adjustable, and an intensity distribution of the exposure light in the illumination region is changed by adjusting said distance.
1 more element
A scanning exposure method comprising:
- emitting exposure light pulses;
- synchronously moving a mask and a substrate in respective scanning directions relative to the exposure light in order to expose the substrate with an image of a pattern formed on the mask,
- wherein the exposure light has an intensity distribution on the substrate in the scanning direction, and the intensity distribution has a slope portion at an edge thereof, and
- wherein the slope portion of the intensity distribution is adjustable.
1 more element
Dependencies are inferred from the claim text.