Substrate exposure apparatus and method
AssigneeVIA Technologies, Inc.
InventorKuo-Tso Chen
Life of this patent
Estimating the term…
Abstract
A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.
Claims25
A substrate exposure method, to transfer a pattern to a photoresist on a surface of a substrate, comprising:
- providing a scan light source at a distance spaced from a surface of the photoresist on the substrate with a distance, wherein the scan light source comprises a plurality of point light sources;
- providing a control system, to convert the pattern into a timing signal to control light and dark status of each of the point light sources at different times, and to provide a scan function, so that the scan light source performs at least one scan along a scan path to expose the photoresist.
A substrate exposure method, to transfer a pattern to a photoresist on a surface of a substrate, comprising:
- providing a scan light source at a distance spaced from a surface of the photoresist on the substrate with a distance, wherein the scan light source comprises a plurality of point light sources;
- and
- providing a control system, to convert the pattern into a timing signal to control light and dark status of each of the point light sources at different times, and to provide a scan function, so that the scan light source performs at least one scan to expose the photoresist, wherein the point light sources are arranged with at least one line light source having an axis not vertical to a scan direction.
Dependencies are inferred from the claim text.