Methods for angle limiting deposition mask
AssigneeThe BOC Group, Inc.
InventorBruce Gordon Ramsay
Life of this patent
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Abstract
A method for depositing a material onto a plurality of features located on a surface of a substrate provides more accurate and consistent control over where the material is deposited. The method comprises evaporating the material to create an evaporant stream, positioning the substrate so that the evaporant stream strikes the plurality of features over a range of exposure angles between the evaporant stream and the substrate, moving the substrate to vary the range of exposure angles over which the evaporant stream strikes the plurality of features, and moving one or more shutters into the evaporant stream to block any part of the evaporant stream that has an exposure angle greater than a critical exposure angle.
Claims19
A method for depositing a material onto a plurality of features located on a surface of a substrate, comprising:
- evaporating the material to create an evaporant stream;
- positioning the substrate so that the evaporant stream strikes the plurality of features over a range of exposure angles between the evaporant stream and the substrate;
- moving the substrate to vary the range of exposure angles over which the evaporant stream strikes the plurality of features;
- and
- moving one or more shutters into the evaporant stream to block any part of the evaporant stream that has an exposure angle greater than a critical exposure angle.
A method for depositing a material onto a plurality of features located on a surface of a substrate, comprising:
- evaporating the material to create an evaporant stream;
- positioning the substrate within the evaporant stream, thereby depositing the material onto portions of the plurality of features;
- moving the substrate, thereby depositing the material onto further portions of the plurality of features;
- and
- moving one or more shutters into the evaporant stream to block any part of the evaporant stream that will contact the surface of the substrate.
Dependencies are inferred from the claim text.