Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus
AssigneeHitachi, Ltd.
InventorsFumio Isshiki, Masakazu Sugaya, Tatsundo Suzuki, Masahiro Yamaoka, Sumio Hosaka
Life of this patent
Estimating the term…
Abstract
An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.
Claims10
A laser interferometer displacement measuring system comprising
- a displacement measurement mechanism making use of laser interference to produce a measurement value;
- and
- corrector means for adding a correction value to or subtracting the correction value from said measurement value produced by said displacement measurement mechanism,
- wherein said correction value used by said corrector means is a cyclic correction value generated based on said measurement value and having a cycle corresponding to a wave cycle of laser light.
A laser interferometer displacement measuring system comprising:
- a displacement measuring mechanism making use of laser interference to produce a measurement value;
- and
- corrector means for adding a correction value to or subtracting the correction value from said measurement value produced by said displacement measurement mechanism,
- wherein said corrector means has storage means for storing as said correction value a cyclic correction value generated based on said measurement value and having a cycle corresponding to a wave cycle of laser light, and
- wherein said correction value is read out of said storage means in accordance with said measurement value and is added to or subtracted from said measurement value.
A laser interferometer displacement measuring system, comprising:
- a laser light source;
- an interferometer for dividing laser light of wavelength λ emitted from said laser light source into a reference path beam and a measurement path beam to interfere said reference path beam with said measurement path beam having been reflected from a subject body;
- a light detector for detecting the light subjected to the interference in said interferometer to produce a measurement value;
- measurement value output means for converting a detection signal of said light detector into said measurement value and outputting said measurement value,
- wherein a displacement of the subject body causes an n-fold variation in length of an optical path between said interferometer and the subject body;
- and
- corrector means for adding a correction value to or subtracting the correction value from said measurement value output by said measurement value output means,
- wherein said measurement value is a variable, and said correction value generated based on said measurement value and used by said corrector means is a cyclic function having a cycle of λ/n or a sum of a plurality of cyclic functions having said cycle of λ/n as a fundamental cycle.
A laser interferometer displacement measuring system comprising:
- a displacement measurement mechanism making use of laser interference to produce a measurement value;
- error signal component generating means for eliminating a constant speed component and an acceleration component from said measurement value produced by said displacement measurement mechanism and generating an error signal component based on said measurement value;
- storage means for storing said error signal component from said error signal component generating means corresponding to said measurement value;
- and
- means for allowing said error signal component stored in said storage means to be added to or subtracted from said measurement value of said displacement measurement mechanism as a correction value.
A laser interferometer displacement measuring system, comprising:
- a laser light source;
- an interferometer for dividing laser light of wavelength λ emitted from said laser light source into a reference path beam and a measurement path beam to interfere said reference path beam with said measurement path beam having been reflected from a subject body;
- a light detector for detecting the light subjected to the interference in said interferometer to produce a measurement value;
- measurement value output means for converting a detection signal of said light detector into said measurement value and outputting said measurement value,
- wherein a displacement of the subject body causes an n-fold variation in length of an optical path between said interferometer and the subject body;
- and
- corrector means for adding a correction value generated based on said measurement value to or subtracting said correction value from said measurement value output by said measurement value output means,
- wherein said corrector means comprises:
- means for storing or calculating, with said measurement value being employed as a variable, said correction value as a cyclic function having a cycle of λ/n or said cyclic function having a cycle of λ/n and harmonic cyclic functions thereof,
- error signal component generating means for eliminating a constant speed component and an acceleration component from said measurement value of said displacement measurement mechanism and generating an error signal component,
- adjustment means for adjusting an amplitude and a phase of said cyclic function so that said cyclic function having a cycle of λ/n or a sum function of said cyclic function having a cycle of λ/n and harmonic cyclic functions thereof fits to said error signal component, and
- means for allowing a function value of said cyclic function having a cycle of λ/n or a function value of said sum function of said cyclic function having a cycle of λ/n and harmonic cyclic functions thereof to be added to or subtracted from said measurement value.
Dependencies are inferred from the claim text.