Scanning exposure method with reduced time between scans

A step-and-scan exposure method in which patterns on a mask are transferred to shot areas on a photosensitive substrate by a series of scanning exposures, the method comprising the steps of:

• disposing a first pattern above a projection optical system;
• exposing the first pattern onto a first shot area through the projection optical system;
• and
• moving the mask from a first position where the exposure of the first pattern has finished to a second position where the exposure of a second pattern onto a second shot area is to start, wherein an acceleration of the mask during movement from the first position to the second position continually has an absolute value greater than zero and no pattern is exposed onto the substrate during movement from the first position to the second position.

A step-and-scan exposure method in which patterns on a mask are transferred to shot areas on a photosensitive substrate by a series of scanning exposures, the method comprising the steps of:

• disposing a first shot area under a projection optical system and a first pattern above the projection optical system;
• exposing the first pattern onto the first shot area through the projection optical system;
• and
• moving the substrate from a first position where the exposure of the first pattern onto the first shot area has finished to a second position where the exposure of a second pattern onto a second shot area is to start, and synchronously moving the mask from a third position where exposure of the first pattern onto the first shot area has finished to a fourth position where exposure of the second pattern onto the second shot area is to start, wherein an acceleration of the substrate during movement from the first position to the second position and an acceleration of the mask during movement from the third position to the fourth position continually have absolute values greater than zero and no pattern is exposed onto the substrate during movement from the first position to the second position.

A method of moving a substrate comprising the steps of:

• disposing a first area of the substrate under a system;
• performing a first operation with respect to the first area;
• and
• moving the substrate from a first position where the first operation with respect to the first area has finished to a second position where a second operation with respect to a second area is to start, continually at an acceleration having an absolute value greater than zero without performing any operation with respect to the substrate.

A method of moving a system above a substrate in which operations are performed relative to areas of the substrate, comprising the steps of:

• disposing the system above a first area of the substrate;
• performing a first operation with respect to the first area;
• and
• moving the system from a first position where the first operation has finished to a second position where a second operation is to start, wherein an acceleration of the system during movement from the first position to the second position continually has an absolute value greater than zero and no operation with respect to the substrate is performed during movement from the first position to the second position.

A method of moving a system and a substrate to perform a series of operations, the method comprising the steps of:

• disposing a first area of the substrate relative to the system;
• performing a first operation with respect to the first area;
• and
• moving the substrate from a first position where the first operation has finished to a second position where a second operation is to start, and synchronously moving the system from a third position where the first operation with respect to the first area has finished to a fourth position where the second operation with respect to the second area is to start, wherein an acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero and no operation with respect to the substrate is performed during movement from the first position to the second position.