Four transistors static-random-access-memory
AssigneeUnited Microelectronics Corp.
InventorChih-Yuan Hsiao
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AssigneeUnited Microelectronics Corp.
InventorChih-Yuan Hsiao
Estimating the term…
A method for forming transistors static-random-access-memory. The method comprises the steps of: providing a substrate which at least comprises a cell area and periphery area, wherein the cell area comprises a first P-type region, a second P-type region, a first N-type region and a second N-type region, the periphery area comprises numerous periphery P-type regions and numerous periphery N-type regions; covering the first P-type region, the second P-type region and the periphery P-type regions by a first photoresist; forming numerous N-type sources and numerous N-type drains in the first P-type region, the second P-type region and the periphery P-type regions. Remove the first photoresist. Use a second photoresist to cover the periphery N-type regions and some the N-type drains which are located in both the first N-type region and the second N-type regions; and performing a large angle implanting process to form numerous P-type enlarged drains and numerous P-type region and the P-type second region, wherein numerous P-type extra sources also are formed on outside of some the N-type drains which are located in both the first N-type region and the second N-type region.
A four transistors static-random-access-memory cell, comprising:
A four transistors static-random-access-memory cell, comprising:
Dependencies are inferred from the claim text.