Scanning exposure apparatus and method

Abstract

A scanning exposure apparatus for transferring a pattern of a master onto each of a plurality of shot regions defined on a substrate, while synchronously scanning the master and the substrate. The apparatus includes a master stage for moving the master, a substrate stage for moving the substrate, and a controller for controlling movement of the substrate stage during scanning exposure of the plurality of shot regions so as to assure that a setting distance in which the substrate stage is moved guarantees that a synchronization error between the master stage and the substrate stage falls within an allowable range after the substrate stage is accelerated up to a scan speed for the scanning exposure. The controller controls the movement of the substrate stage such that a setting distance for first shot region, which is exposed first upon a change in a row to which a shot region to be exposed belongs, is set to be longer than a setting distance for other shot regions.

Dependencies are inferred from the claim text.