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US 6,674,092 B1Granted
Thin film CMOS calibration standard having protective cover layer
AssigneeLSI Logic Corporation
InventorsWai Lo, David Chan
Life of this patent
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Abstract
Embodiments of the invention include a calibration standard for semiconductor metrology tools. The standard comprises a substrate having a surface with a calibration layer formed thereon. A protective layer is formed over the underlying calibration layer. The calibration layer and protective layer are each formed to precise tolerances. The invention also includes methods for forming a calibration standard for semiconductor metrology tools.
Claims14
A calibration standard for semiconductor metrology tools, the standard comprising:
- a calibration substrate having a surface;
- a calibration layer formed on the surface of the substrate to a thickness that is substantially similar to a desired target thickness;
- and
- a protective layer formed over the calibration layer to prevent the deterioration of the underlying calibration layer.
1 more element
Dependencies are inferred from the claim text.