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US 6,673,684 B1Granted
Use of diamond as a hard mask material
AssigneeAdvanced Micro Devices, Inc.
InventorsRichard J. Huang, Philip A. Fisher, Cyrus E. Tabery
Life of this patent
Estimating the term…
Abstract
A method for producing an integrated circuit includes providing a diamond layer above a layer of conductive material. A cap layer is provided above the diamond layer and patterned to form a cap feature. The diamond layer is patterned according to the cap feature to form a mask, and at least a portion of the layer of conductive material is removed according to the mask.
Claims20
A method for producing an integrated circuit comprising:
- providing a diamond layer above a layer of conductive material;
- providing a cap layer above the diamond layer;
- patterning the cap layer to form a cap feature;
- patterning the diamond layer according to the cap feature to form a mask;
- and
- removing at least a portion of the layer of conductive material according to the mask.
3 more elements
A method of forming features in an integrated circuit comprising:
- depositing a layer including carbon having a generally diamond cubic crystallographic structure above a layer of polysilicon;
- depositing a layer of anti-reflective coating (ARC) material over the layer including carbon;
- removing a portion of the layer including diamond to form a mask feature;
- etching the layer of polysilicon according to the mask feature;
- and
- removing the mask feature.
3 more elements
An integrated circuit manufactured by a method comprising:
- providing a layer of conductive material above a semiconductor substrate;
- providing a layer comprising diamond material above the layer of conductive material;
- providing a layer of anti-reflective coating (ARC) material above the layer comprising diamond material;
- removing a portion of the layer of ARC material to form an ARC feature;
- removing a portion of the layer comprising diamond material according to the ARC feature to form a diamond mask;
- and
- etching the layer of conductive material according to the diamond mask to form a conductive line.
4 more elements
Dependencies are inferred from the claim text.