Polymer, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
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Abstract
The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
Claims20
A polymer comprising recurring units of the following general formulae (1-1) and (2-1), and having a weight average molecular weight of 1,000 to 500,000:
- wherein k is 0 or 1, mis 0, 1, 2, 3, or 4, n is 1 or 2,
- R1 is hydrogen, methyl or CH2CO2R3,
- R2 is hydrogen, methyl or C02R3,
- R3 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms,
- R4 is an acid labile group,
- R5 is selected from the group consisting of a halogen atom, hydroxyl group, a straight, branched or cyclic alkoxy, acyloxy or alkylsulfonyloxy group of 1 to 15 carbon atoms, and a straight, branched or cyclic alkoxyalkoxy or alkoxycarbonyloxy group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms,
- Z is a single bond or a straight, branched or cyclic (p+2)-valent hydrocarbon group of 1 to 5 carbon atoms, in which at least one methylene may be substituted with oxygen to form a chain-like or cyclic ether or two hydrogen atoms on a common carbon may be substituted with oxygen to form a ketone, and
- p is 0, 1 or 2.
A polymer comprising recurring units of the following general formulae (1-1), (2-1) and (3), and having a weight average molecular weight of 1,000 to 500,000,
- wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, n is 1 or 2,
- R1 is hydrogen, methyl or CH2CO2R3,
- R2 is hydrogen, methyl or CO2R3,
- R3 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms,
- R4 is an acid labile group,
- R5 is selected from the group consisting of a halogen atom, hydroxyl group, a straight, branched or cyclic alkoxy, acyloxy or alkylsulfonyloxy group of 1 to 15 carbon atoms, and a straight, branched or cyclic alkoxyalkoxy or alkoxycarbonyloxy group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms,
- Z is a single bond or a straight, branched or cyclic (p+2)-valent hydrocarbon group of 1 to 5 carbon atoms, in which at least one methylene may be substitute with oxygen to form a chain-like or cyclic ether or two hydrogen atoms on a common carbon may be substituted with oxygen to form a ketone, and
- p is 0, 1 or 2.
A polymer comprising recurring units of the following general formula (1-1), recurring units of the following general formula (4) alone or in combination with recurring units of the following general formula (2-1), and recurring units of the following general formula (3), and having a weight average molecular weight of 1,000 to 500,000,
- wherein k is 0 or 1, m is 0, 1, 2, 3, or 4, n is 1 or 2,
- R1 is hydrogen, methyl or CH2CO2R3,
- R2 is hydrogen, methyl or CO2R3,
- R3 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms,
- R4 is an acid labile group,
- R5 is selected from the group consisting of a halogen atom, hydroxyl group, a straight, branched or cyclic alkoxy, acyloxy or alkylsulfonyloxy group of 1 to 15 carbon atoms, and a straight, branched or cyclic alkoxyalkoxy or alkoxycarbonyloxy group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms,
- Z is a single bond or a straight, branched or cyclic (p+2)-valent hydrocarbon group of 1 to 5 carbon atoms, in which at least one methylene may be substituted with oxygen to form a chain-like or cyclic ether or two hydrogen atoms on a common carbon may be substituted with oxygen to form a ketone, and
- p is 0, 1 or 2.
A polymer comprising recurring units of the following general formulae (1-2) and (2-2) and having a weight average molecular weight of 1,000 to 500,000,
- wherein k is 0 or 1, m is 0, 1,2,3, or 4, n is 1 or 2,
- R1 is hydrogen, methyl or CH2CO2R3,
- R2 is hydrogen, methyl or CO2R3,
- R3 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms,
- R4 is an acid labile group,
- R5 is selected from the group consisting of a halogen atom, hydroxyl group, a straight, branched or cyclic alkoxy, acyloxy or alkylsulfonyloxy group of 1 to 15 carbon atoms, and a straight, branched or cyclic alkoxyalkoxy or alkoxycarbonyloxy group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms,
- Z is a single bond or a straight, branched or cyclic (p+2)-valent hydrocarbon group of 1 to 5 carbon atoms, in which at least one methylene may be substituted with oxygen to form a chain-like or cyclic ether or two hydrogen atoms on a common carbon may be substituted with oxygen to form a ketone, and
- p is 0, 1 or 2.
Dependencies are inferred from the claim text.