Negative-working resist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsKazuya Uenishi, Yutaka Adegawa, Koji Shirakawa
Life of this patent
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Abstract
A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:
Claims41
A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, a crosslinking agent which initiates crosslinking by the acid, and an organic basic compound:
- wherein R1 represents a hydrogen atom, a halogen atom, a cyano group, or an alkyl, oxyalkyl or haloalkyl group which may have a substituent;
- X represents an integer of from 0 to 3;
- R2 represents a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, aralkyl, aryl or acyl group which may have a substituent, wherein when a plurality of R2's are present, they may be the same or different;
- R3 represents a hydrogen atom, a halogen atom, a cyano atom, or an alkyl, cycloalkyl, alkenyl, aralkyl or aryl group which may have a substituent, wherein when a plurality of R3's are present, they may be the same or different;
- two of the plurality of R2's, two of the plurality of R3's, or R2 and R3 may combine with each other to form a ring;
- A1 represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have a substituent, or —O—, —SO2—, —O—CO—R5—, —CO—O—R6— or —CO—N(R7)—R8—, wherein R5, R6 and R8, which may be the same or different, each represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have an ether group, an ester group, an amido group, a urethane group or a ureido group and may further have a substituent, and R7 represents a hydrogen atom, or an alkyl, cycloalkyl, aralkyl or aryl group which may have a substituent,
- wherein said crosslinking agent which initiates crosslinking by the acid is a phenol derivative having from 3 to 5 benzene ring atomic groups in its molecule and a molecular weight of 1200 or less, each of the benzene ring atomic groups having two or more hydroxymethyl groups and/or alkoxymethyl groups.
A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, a crosslinking agent which initiates crosslinking by the acid, and an organic basic compound:
- wherein R1 represents a hydrogen atom, a halogen atom, a cyano group, or an alkyl, oxyalkyl or haloalkyl group which may have a substituent;
- X represents an integer of from 0 to 3;
- R2 represents a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, aralkyl, aryl or acyl group which may have a substituent, wherein when a plurality of R2's are present, they may be the same or different;
- R3 represents a hydrogen atom, a halogen atom, a cyano atom, or an alkyl, cycloalkyl, alkenyl, aralkyl or aryl group which may have a substituent, wherein when a plurality of R3's are present, they may be the same or different;
- two of the plurality of R2's, two of the plurality of R3's, or R2 and R3 may combine with each other to form a ring;
- A1 represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have a substituent, or —O—, —SO2—, —O—CO—R5—, —CO—O—R6— or —CO—N(R7)—R8—, wherein R5, R6 and R8, which may be the same or different, each represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have an ether group, an ester group, an amido group, a urethane group or a ureido group and may further have a substituent, and R7 represents a hydrogen atom, or an alkyl, cycloalkyl, aralkyl or aryl group which may have a substituent,
- wherein said organic basic compound is at least one compound selected from the group consisting of substituted or unsubstituted guanidine, substituted or unsubstituted aminopyridine, substituted or unsubstituted aminoalkylpyridines, substituted or unsubstituted aminopyrrolidine, substituted or unsubstituted indazole, imidazole, substituted or unsubstituted pyrazole, substituted or unsubstituted pyrazine, substituted or unsubstituted pyrimidine, substituted or unsubstituted purine, substituted or unsubstituted imidazoline, substituted or unsubstituted pyrazoline, substituted or unsubstituted piperazine, substituted or unsubstituted aminomorpholine and substituted or unsubstituted aminoalkylmorpholines.
A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, a crosslinking agent which initiates crosslinking by the acid, and an organic basic compound:
- wherein R1 represents a hydrogen atom, a halogen atom, a cyano group, or an alkyl, oxyalkyl or haloalkyl group which may have a substituent;
- X represents an integer of from 0 to 3;
- R2 represents a hydrogen atom, or an alkyl, cycloalkyl, alkenyl, aralkyl, aryl or acyl group which may have a substituent, wherein when a plurality of R2's are present, they may be the same or different;
- R3 represents a hydrogen atom, a halogen atom, a cyano atom, or an alkyl, cycloalkyl, alkenyl, aralkyl or aryl group which may have a substituent, wherein when a plurality of R3's are present, they may be the same or different;
- two of the plurality of R2's, two of the plurality of R3's, or R2 and R3 may combine with each other to form a ring;
- A1 represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have a substituent, or —O—, —SO2—, —O—CO—R5—, —CO—O—R6— or —CO—N(R7)—R8—, wherein R5, R6 and R8, which may be the same or different, each represents a single bond, or a divalent alkylene, alkenylene, cycloalkylene or arylene group which may have an ether group, an ester group, an amido group, a urethane group or a ureido group and may further have a substituent, and R7 represents a hydrogen atom, or an alkyl, cycloalkyl, aralkyl or aryl group which may have a substituent,
- wherein said compound capable of generating an acid by irradiation of the electron beam or the X-ray is selected from the group consisting of the following general formulas (I), (II) and (III):
- wherein R1 to R37 each represents a hydrogen atom, an alkyl group, an alkoxyl group, a hydroxyl group, a halogen atom or a group indicated by —S—R38, wherein R38 represents an alkyl group or an aryl group;
- R1 to R38 may be the same or different;
- for R1 to R15, two or more selected therefrom may be combined with each other directly at their ends or through an element selected from the group consisting of oxygen, sulfur and nitrogen to form a ring structure, for R16 to R27, a ring structure may also be formed similarly, and for R28 to R37, a ring structure may also be formed similarly;
- and X− represents an anion of a benzenesulfonic acid, a naphthalenesulfonic acid or an anthracenesulfonic acid, each of which is substituted by at least one fluorine atom or a substituent containing at least one of fluorine atom.
Dependencies are inferred from the claim text.