Pressurized liquid diffuser
AssigneeMicron Technology, Inc.
InventorL. Brian Dunn
Life of this patent
Estimating the term…
Abstract
The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.
Claims68
A semiconductor processing system, comprising:
- a plurality of wafers housed in a wet processing system;
- and
- a diffuser in liquid communication with the wafers, the diffuser comprising:
- a plurality of plenums adapted to receive a supply of fluid;
- and
- a plate in fluid communication with the plurality of plenums, the plate comprising a plurality of slits arranged in rows, a plurality of the rows comprising at least a central slit and an end slit, the central slits of at least two rows having different lengths, the end slits of at least two rows having different lengths.
A semiconductor processing system, comprising:
- a tank housing a plurality of wafers;
- a diffuser positioned generally below the wafers, the diffuser comprising a slotted surface for pressurizing fluid within the diffuser, the slotted surface comprising a plurality of rows of slots;
- and
- a substantially central slot in at least a plurality of the rows of slots, wherein the central slot of a first row has a different length than the central slot of a second row.
A semiconductor processing system, comprising:
- a tank housing a plurality of wafers;
- and
- a diffuser positioned generally below the wafers, the diffuser comprising a slotted surface for pressurizing fluid within the diffuser, the slotted surface comprising a plurality of rows of slots, at least two of the rows comprising end slots of different lengths.
A semiconductor processing apparatus, comprising:
- a tank holding one or more wafers;
- and
- a distributor positioned generally above the wafers, the distributor comprising a slitted plate for providing a flow across the wafers, the slitted plate being generally rectangular in shape and comprising a plurality of rows of slits, at least two of the rows comprising end slits of different lengths.
A semiconductor processing apparatus, comprising:
- a tank holding one or more wafers;
- a distributor positioned generally above the wafers, the distributor comprising a slitted plate for providing a flow across the wafers, the slitted plate being generally rectangular in shape and comprising a plurality of rows of slits;
- and
- a substantially central slit in at least a plurality of the rows of slots, wherein the central slit of a first row has a different length than the central slit of a second row.
A semiconductor processing system, comprising:
- a tank holding a plurality of wafers with their large flat sides vertically oriented and spaced in generally parallel aligned relation;
- and
- a sparger in fluid communication with the wafers for providing a flow across the wafers, the sparger comprising:
- a first plate comprising a plurality of chambers, each of the chambers having at least one opening for receiving a supply of fluid;
- and
- a second plate in fluid and mechanical communication with the first plate, the second plate comprising a plurality of slots arranged in rows to pressurize fluid within the first plate, a predetermined number of the rows being generally aligned with a respective one of the chambers, the rows forming a pattern with at least a first row comprising a shorter central slot between two longer end slots and at least a second row comprising a longer central slot between two shorter end slots.
A semiconductor processing apparatus, comprising:
- one or more wafers housed substantially stationary within a wet processing tank;
- and
- a diffuser in liquid communication with the tank for providing a generally uniform and/or laminar flow across the wafers, the diffuser comprising:
- a plenum plate including a base plate and a plurality of walls to form five plenums adapted to receive a supply of a liquid, the plenums being generally rectangular in shape;
- and
- a slitted plate mechanically connected to the plenum plate and in fluid communication with the plenums to pressurize the liquid within the plenums, the slitted plate being generally rectangular in shape and comprising a plurality of rows with at least three slits, the slits being arranged in a staggered pattern, the rows being arranged in an alternating pattern.
Dependencies are inferred from the claim text.