Positive working photosensitive composition, article and process for forming a relief pattern
AssigneeIndustrial Technology Research Institute
InventorsSteve Lien-Chung Hsu, Jinn-Shing King, Po-I Lee, Jhy-Long Jeng
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Abstract
The present invention relates to a positive-working photosensitive composition comprising a partially diazonaphthoquinone (DNQ) capped polyamic ester with a capping level of about 5-80 molar %; a photosensitive agent and a solvent. The composition shows a high photosensitivity and leaves a relief pattern with high resolution and low dark film loss.
Claims24
A positive-working photosensitive composition comprising:
- (a) a partially diazonaphthoquinone (DNQ) capped polyamic ester, wherein the partially diazonaphthoquinone (DNQ) capped polyamic ester has a capping level of about 5-80 molar %;
- (b) a photosensitive agent;
- and
- (c) a solvent.
A photosensitive article, comprising a support coated thereon a layer comprising a partially diazonaphthoquinone (DNQ) capped polyamic ester, a photosensitive agent and a solvent.
Dependencies are inferred from the claim text.