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US 6,669,995 B1Granted
Method of treating an anti-reflective coating on a substrate
OwnerLinda Insalaco, James Mitchenerinventors
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Abstract
A method of treating an anti-reflective coating on a substrate. The method includes exposing the anti-reflective coating to a dosage of ultraviolet radiation sufficient to result in the direct removal of at least a portion of the exposed anti-reflective coating.
Claims33
A method of treating an anti-reflective coating on a substrate, said method comprising:
- directly exposing an exposed anti-reflective coating to a dosage of ultraviolet radiation sufficient to result in the direct removal of at least a portion of the exposed anti-reflective coating.
A method of forming an electronic device, said method comprising the steps of:
- a) providing a substrate;
- b) depositing a layer of an anti-reflective coating on the substrate;
- c) depositing a layer of a photoresist material on the anti-reflective coating;
- d) exposing the layer of photoresist to ultraviolet radiation of a dosage sufficient to cause the photoresist to selectively become soluble in developer;
- e) developing the photoresist with a developer to remove portions of the photoresist thereby exposing the anti-reflective coating under portions of the photoresist removed by the developer;
- f) subjecting the exposed anti-reflective coating to ultraviolet radiation sufficient to directly remove at least a portion of the exposed anti-reflective coating while simultaneously crosslinking the photoresist;
- and
- g) selectively etching a pattern of circuitry on said substrate.
5 more elements
Dependencies are inferred from the claim text.