Method for forming a liquid film on a substrate
AssigneeKabushiki Kaisha Toshiba
InventorShinichi Ito
Life of this patent
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Abstract
A liquid film forming method of dropping a liquid from a dropping nozzle or dropping nozzles of a dropping unit onto a substrate to be processed, and then providing relative movement between the dropping unit and the substrate while keeping the liquid dropping on the substrate, so as to form a liquid film on the substrate
Claims5
A liquid film forming method of dropping a liquid from a dropping nozzle or dropping nozzles of a dropping unit onto a disc-shaped substrate to be processed, and then providing relative movement between the dropping unit and the substrate while keeping the liquid dropping on the substrate, so as to form a liquid film on the substrate,
- wherein the relative movement between the dropping unit and the substrate is composed of straight movement along a file direction in which the dropping unit passes from one end side of the substrate over the substrate to the other end side of the substrate, and movement along a rank direction perpendicular to the file direction outside the substrate at a pitch p,
- the movement along the file direction includes movement of a constant speed of v in a section where the dropping nozzle passes over the substrate, and movement of an acceleration of a or −a in the section where the dropping nozzle passes over an outside of the substrate;
- wherein a dropping amount per unit W of the liquid dropped from the nozzle, where W is measured in volume/time, is proportional to the movement of a constant speed V;
- and
- the movement of the constant speed v along the file direction is represented by the formula
- v=(0.4(D)(a))1/2
- where (D) is the diameter of the disc-shaped substrate, and (a) is the absolute value of acceleration.
Dependencies are inferred from the claim text.