Dual-scan thin film processing system
AssigneeUnaxis USA Inc.
InventorsPiero Sferlazzo, Chunghsin Lee
Life of this patent
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Abstract
A deposition system is described. The deposition system includes a deposition source that generates deposition flux comprising neutral atoms and molecules. A shield defining an aperture is positioned in the path of the deposition flux. The shield passes the deposition flux through the aperture and substantially blocks the deposition flux from propagating past the shield everywhere else. A substrate support is positioned adjacent to the shield. A dual-scanning system scans the substrate support relative to the aperture with a first and a second motion.
Claims30
A deposition system comprising:
- a. a deposition source that generates deposition flux comprising neutral atoms and molecules;
- b. a shield defining an aperture that is positioned in the path of the deposition flux, the shield passing the deposition flux though the aperture and substantially blocking the deposition flux from propagating past the shield everywhere else;
- c. a substrate support that is positioned adjacent to the shield;
- and
- d. a dual-scanning system that scans the substrate support relative to the aperture with a first and a second motion, at least one of the first and the second motions comprising a translational motion.
A method of depositing a uniform thin film, the method comprising:
- a. generating deposition flux;
- and
- b. scanning a substrate relative to the deposition flux with a first motion and a second motion, wherein a scan rate of the first motion is greater than a scan rate of the second motion, thereby depositing a uniform thin film onto the substrate.
An ion beam sputter deposition system comprising:
- a. an ion source that generates an ion beam;
- b. a target that is positioned in the path of the ion beam, the target generating deposition flux when exposed to the ion beam;
- c. a shield defining an aperture that is positioned in the path of the deposition flux, the shield passing the deposition flux though the aperture and substantially blocking the deposition flux from propagating past the shield everywhere else;
- d. a substrate support that is positioned adjacent to the shield;
- and
- e. a dual-scanning system that scans the substrate support, the dual-scanning system comprising a rotational scanning system that scans the substrate support at a rotation rate and a translational scanning system that scans the substrate support relative to the aperture at a translational rate.
Dependencies are inferred from the claim text.