Apparatus for removing a coating film

An apparatus for removing a coating film comprising:

• a chemical rinse nozzle having an opening ejecting, over a first range, a chemical dissolving a coating film around the perimeter of an end surface of a substrate formed with the coating film;
• and
• a slit type blow nozzle having a slit opening ejecting, at high pressure over a second range, gas to the substrate so as to remove the coating film dissolved by the chemical from the substrate, wherein,
• the second range covered by the blow nozzle is greater than the first range covered by the rinse nozzle,
• the chemical rinse nozzle comprises a slit type chemical rinse nozzle having an opening in slit form,
• the slit type chemical rinse nozzle is arranged between the slit type blow nozzle and the end of the substrate, and
• further comprising a slit type pure water rinse nozzle having a slit opening ejecting pure water between the slit type blow nozzle and the slit type chemical rinse nozzle,
• wherein the integration of the slit type pure water rinse nozzle and the slit type blow nozzle by being separated by a common partition comprises a slit type pure water rinse and blow nozzle provided with a slit opening ejecting the gas and the pure water independently.

An apparatus for removing a coating from a substrate having a side length, film comprising:

• an integrated nozzle forming a slit type rinse nozzle positioned immediately adjacent a slit type blow nozzle,
• the rinse nozzle and the blow nozzle being separated by a common partition,
• the slit type rinse nozzle ejecting a chemical onto the coating for dissolving the coating from the substrate,
• the slit type blow nozzle ejecting a gas onto the substrate to remove the dissolved coating from the substrate,
• the slit type rinse nozzle and the slit type blow nozzle having openings sized to extend along one side of the substrate, a length of the slit type rinse nozzle opening and a length of the slit type blow nozzle opening both being greater than the side length of the substrate,
• wherein, the integration of the rinse nozzle and the blow nozzle provides a combination rinse and blow nozzle provided with a slit opening ejecting the gas and the rinse independently.