Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

A computer readable medium for correcting a fabrication layout corresponding to an original fabrication layout for proximity effects, the computer readable medium carrying instructions to cause one or more processors to perform:

• executing a routine implementing a proximity effects model to produce an initial output based on a first position for a segment in a fabrication layout displaced from a corresponding original edge in the original fabrication layout by a distance equal to an initial bias;
• executing the routine implementing the proximity effects model to produce a second output based on a second position for the segment displaced from the corresponding original edge by a distance equal to a second bias;
• determining an optimal bias for the segment based on the initial output and the second output;
• and
• displacing the segment in the fabrication layout from the corresponding edge based on the optimal bias.

A carrier wave for correcting a fabrication layout corresponding to an original fabrication layout for proximity effects, the carrier wave carrying instructions to cause one or more processors to perform:

• executing a routine implementing a proximity effects model to produce an initial output based on a first position for a segment in a fabrication layout displaced from a corresponding original edge in the original fabrication layout by a distance equal to an initial bias;
• executing the routine implementing the proximity effects model to produce a second output based on a second position for the segment displaced from the corresponding original edge by a distance equal to a second bias;
• determining an optimal bias for the segment based on the initial output and the second output;
• and
• displacing the segment in the fabrication layout from the corresponding edge based on the optimal bias.

A computer system for correcting a fabrication layout corresponding to an original fabrication layout for proximity effects, the computer system comprising:

• a computer readable medium carrying data representing the original fabrication layout;
• and
• one or more processors coupled to the computer readable medium, the one or more processors configured for
• executing a routine implementing a proximity effects model to produce an initial output based on a first position for a segment in a fabrication layout displaced from a corresponding original edge in the original fabrication layout by a distance equal to an initial bias,
• executing the routine implementing the proximity effects model to produce a second output based on a second position for the segment displaced from the corresponding original edge by a distance equal to a second bias,
• determining an optimal bias for the segment based on the initial output and the second output, and
• displacing the segment in the fabrication layout from the corresponding edge based on the optimal bias.

A method for fabricating a printed features layer including features corrected for proximity effects, the method comprising:

• executing a routine implementing a proximity effects model to produce an initial output based on a first position for a segment in a fabrication layout displaced from a corresponding original edge in an original fabrication layout for the printed features layer by a distance equal to an initial bias;
• executing the routine implementing the proximity effects model to produce a second output based on a second position for the segment displaced from the corresponding original edge by a distance equal to a second bias;
• determining an optimal bias for the segment based on the initial output and the second output;
• displacing the segment in the fabrication layout from the corresponding edge based on the optimal bias;
• producing a mask based on the fabrication layout with the segment displaced;
• and
• producing the printed features layer in a fabrication process using the mask.

A mask for fabricating a printed features layer, the mask including an opaque region having a segment corrected for proximity effects, the segment corresponding to at least one portion of a target edge in an original fabrication layout for the printed features layer, wherein:

• the segment is displaced from the corresponding portion by a correction distance;
• the correction distance is based on an initial output of a proximity effects model and a second output of the proximity effects model;
• the initial output is based on a first position for a segment in a fabrication layout displaced from the corresponding portion by a distance equal to an initial bias;
• and
• the second output is based on a second position for the segment displaced from the corresponding portion by a distance equal to a second bias.

A device having a proximity-corrected element, the device produced using a mask including an opaque region having a segment corrected for proximity effects, the segment corresponding to at least one portion of a target edge in an original fabrication layout for the printed features layer, wherein:

• the segment is displaced from the corresponding portion by a correction distance;
• the correction distance is based on an initial output of a proximity effects model and a second output of the proximity effects model;
• the initial output is based on a first position for a segment in a fabrication layout displaced from the corresponding portion by a distance equal to an initial bias;
• and
• the second output is based on a second position for the segment displaced from the corresponding portion by a distance equal to a second bias.