Controlled aging of photoresists for faster photospeed
AssigneeInternational Business Machines Corporation
InventorsLaird MacDowell, Erik Puttlitz
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Abstract
A method for the controlled aging of a photoresist which provides an aged photoresist that has a targeted photospeed which is faster than a conventional unaged photoresist is provided. Specifically, the inventive method includes the step of aging a solution containing at least a photoresist resin composition at a temperature below the thermal decomposition of the photoresist resin composition, but not below 20° C., for a time period that is effective in achieving a targeted photospeed which is faster than a photospeed of an unaged photoresist.
Claims15
A method for the controlled aging of a photoresist to a targeted photospeed, said method comprising the step of:
- aging a solution containing at least a photoresist resin composition at a temperature below the thermal decomposition of said photoresist resin composition, but not below 20° C., for a time period that is effective in achieving a targeted photospeed that is above the photospeed of an unaged photoresist;
- and
- wherein said aging is carried out at a temperature of from about 25° C. to about 30° C. for a time period of from about 1 to about 30 days;
- and
- wherein said solution further comprises a photoacid generator, a photosensitizer, a base, and a surfactant.
Dependencies are inferred from the claim text.