Polymers, resist compositions and patterning process
AssigneesShin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd.
InventorsJun Hatakeyama, Yuji Harada, Jun Watanabe, Masaru Sasago, Masayuki Endo, Shinji Kishimura
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Abstract
A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.
Claims24
A polymer comprising recurring units of the following general formula (1):
- wherein R1, R2, R3 and R5 each are independently hydrogen, fluorine, or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R4 is an acid labile group, letters a, b and c are numbers satisfying 0≦a<5, 0≦b<5, 0<a+b<5 and 0c<5, and m and n are positive numbers.
A polymer comprising recurring units of the formula:
- wherein R1, R2, R3 and R5 each are independently hydrogen, fluorine, or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R4 is an acid labile group, letters a, b and c are numbers satisfying 0≦a<5, 0≦b<5, 0<a+b<5 and 0<c<5, m and n are positive numbers, and the unit X is present and represents less than 50 mol % of the polymer.
A chemically amplified, positive resist composition comprising:
- (A) polymer comprising recurring units of the formula:
- wherein R1, R2, R3 and R5 each are independently hydrogen, fluorine, or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R4 is an acid labile group, letters a, b and c are numbers satisfying 0≦a<5, 0≦b<5, 0<a+b<5 and 0<c<5, and m and n are positive numbers,
- (B) an organic solvent,
- (C) a photoacid generator, and
- (D) a basic compound.
Dependencies are inferred from the claim text.