Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
AssigneeFuji Photo Film Co., Ltd.
InventorsKazuo Fujita, Shiro Tan
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AssigneeFuji Photo Film Co., Ltd.
InventorsKazuo Fujita, Shiro Tan
Estimating the term…
The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.
A photosensitive composition comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A) and at least one monomer unit derived from monomer compound (B) described below and the content of monomer unit derived from (A) ranges from 10 to 35% by mole:
A photosensitive composition comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A) and at least one monomer unit derived from monomer compound (B) described below, and an acrylonitrile or methacrylonitrile;
Dependencies are inferred from the claim text.