Method to reduce data size and data preparation time for optical proximity correction of photo masks
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorRen-Guey Hsieh
Life of this patent
Estimating the term…
Abstract
A method of adding optical proximity correction, OPC, to a base pattern is described. A base pattern is represented by a digital base pattern data file. A first OPC data file representing a first OPC pattern which adds pattern width at exterior corners of the pattern and a second OPC data file representing a second OPC pattern which reduces pattern width at interior corners of the pattern are formed. The final data file results from the logical subtraction of the second OPC data file from an interim data file formed by the logical OR of the base pattern data file and the first OPC data file. The final data file can be used to form masks or to inspect masks.
Claims26
A method of adding optical proximity correction to patterns, comprising:
- providing a mask pattern having a number of first regions and a number of second regions;
- providing digital pattern data for said mask pattern;
- forming a first optical proximity correction pattern wherein said first optical proximity correction pattern adds pattern width at said first regions of said mask pattern;
- forming a second optical proximity correction pattern wherein said second optical proximity correction pattern reduces pattern width at said second regions of said mask pattern;
- forming digital first OPC data for said first optical proximity correction pattern;
- forming digital second OPC data for said second optical proximity correction pattern;
- forming digital composite data wherein said digital composite data is said digital pattern data OR said digital first OPC data, and wherein OR represents the logical OR operation;
- and
- forming digital final data wherein said digital final data is formed by the logical subtraction of said digital second OPC data from said digital composite data, and said digital final data represents said mask pattern with optical proximity correction.
A method of adding optical proximity correction to masks, comprising:
- providing a mask pattern having a number of first regions and a number of second regions;
- providing digital pattern data for said mask pattern;
- forming a first optical proximity correction pattern wherein said first optical proximity correction pattern adds pattern width at said first regions of said mask pattern;
- forming a second optical proximity correction pattern wherein said second optical proximity correction pattern reduces pattern width at said second regions of said mask pattern;
- forming digital first OPC data for said first optical proximity correction pattern;
- forming digital second OPC data for said second optical proximity correction pattern;
- forming digital composite data wherein said digital composite data is said digital pattern data OR said digital first OPC data, and wherein OR represents the logical OR operation;
- forming digital final data wherein said digital final data is formed by the logical subtraction of said digital second OPC data from said digital composite data, and said digital final data represents said mask pattern with optical proximity correction;
- and
- using said digital final data to form a mask having said mask pattern with digital proximity correction.
A method of inspecting masks having optical proximity correction, comprising:
- providing a mask pattern having a number of first regions and a number of second regions;
- providing digital pattern data for said mask pattern;
- forming a first optical proximity correction pattern wherein said first optical proximity correction pattern adds pattern width at said first regions of said mask pattern;
- forming a second optical proximity correction pattern wherein said second optical proximity correction pattern reduces pattern width at said second regions of said mask pattern;
- forming digital first OPC data for said first optical proximity correction pattern;
- forming digital second OPC data for said second optical proximity correction pattern;
- forming digital composite data wherein said digital composite data is said digital pattern data OR said digital first OPC data, and wherein OR represents the logical OR operation;
- forming digital final data wherein said digital final data is formed by the logical subtraction of said digital second OPC data from said digital composite data, and said digital final data represents said mask pattern with optical proximity correction;
- using said digital final data to inspect masks having said mask pattern with digital proximity correction.
Dependencies are inferred from the claim text.