Film or coating deposition on a substrate
AssigneeInnovative Materials Processing Technologies Limited
InventorsKwang-Leong Choy, Wei Bai
Life of this patent
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Abstract
A method of depositing a material onto a substrate, comprising the steps of: feeding a material solution to an outlet to provide a stream of droplets of the material solution; applying a potential difference between the outlet and a substrate to electrostatically attract the droplets from the outlet towards the substrate such that a corona discharge is formed around the outlet; heating the substrate to provide an increase in temperature between the outlet and the substrate; and progressively increasing the temperature of the substrate during material deposition.
Claims8
An apparatus for depositing a material onto a substrate, comprising:
- an outlet;
- a material solution feeder for feeding a material solution to the outlet to provide a stream of droplets of the material solution;
- a voltage source for applying a potential difference between the outlet and the substrate to electrostatically attract the droplets from the outlet towards the substrate;
- a heater for heating the substrate to provide an increase in temperature between the outlet and the substrate;
- a heating controller for controlling the heater;
- and
- a temperature detector for detecting the temperature of a material-receiving surface on the substrate;
- wherein the heating controller is configured so as to be responsive to the temperature detector to progressively increase the temperature of the substrate during material deposition so as to maintain a substantially constant temperature at the material-receiving surface.
Dependencies are inferred from the claim text.