Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsMasatoshi Deguchi, Eiichi Sekimoto
Life of this patent
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Abstract
The present invention is a substrate processing apparatus for performing processing of a substrate including: a heat treatment unit provided in a casing of the processing apparatus and having a heating section in which a heat treatment of the substrate is performed; a duct provided on a side part on the heating section side of the casing; and a cooling flow passage provided in the duct for allowing a cooling fluid to flow therethrough. Heat generated from the heating section is prevented from conducting by an air current flowing in the duct, and further the heat is absorbed by the cooling fluid. Therefore, it is possible to prevent the heat from conducting to the outside of the casing.
Claims11
A substrate processing apparatus for performing processing of a substrate, comprising:
- a heat treatment unit which is provided in a casing of said processing apparatus and in which a heat treatment of the substrate is performed;
- a duct provided on a side part of said casing, said duct having a plurality of partition plates partitioning the duct;
- and
- an air current generating mechanism for generating an air current flowing in said duct.
A substrate processing apparatus for performing processing of a substrate, comprising:
- a heat treatment unit which is provided in a casing of said processing apparatus and in which a heat treatment of the substrate is performed;
- a duct provided on a side part of said casing;
- an air current generating mechanism for generating an air current flowing in said duct;
- and
- a cooling device provided in said duct and configured to cool said air current,
- wherein said cooling device has a cooling plate, and said cooling plate has a flow passage for allowing a cooling fluid to pass therethrough.
A substrate processing apparatus for performing processing of a substrate, comprising:
- a heat treatment unit which is provided in a casing of said processing apparatus and in which a heat treatment of the substrate is performed;
- a duct provided on a side part of said casing;
- an air current generating mechanism for generating an air current flowing in said duct;
- and
- a mist supply unit for supplying a mist of a cooling water into said duct.
A substrate processing apparatus for performing processing of a substrate, comprising:
- a heat treatment unit provided in a casing of said processing apparatus and having a heating section in which a heat treatment of the substrate is performed;
- a duct provided on a side part on said heating section side of said casing;
- a cooling flow passage provided in said duct for allowing a cooling fluid to flow therethrough;
- a wiring accommodation unit for accommodating at least an electric wiring;
- and
- a heat insulating panel disposed between said wiring accommodation unit and said heating section and formed with a flow passage through which a cooling fluid passes.
Dependencies are inferred from the claim text.