Resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsFumiyoshi Urano, Hirotoshi Fujie, Naoki Takeyama, Koji Ichikawa
Life of this patent
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Abstract
A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.
Claims2
A chemically amplified resist composition comprising
- (a) two or more polymers which become alkali-soluble by an action of an acid and represented by the formula:
- wherein R1 and R2 are independently a hydrogen atom or a methyl group;
- R3 and R4 are independently a hydrogen atom, a straight-chain, branched or cyclic alkyl group having 1 to 6 carbon atoms, a straight-chain, branched or cyclic haloalkyl group having 1 to 6 carbon atoms, a phenyl group which may have one or more substituents, or R3 and R4 can together form a methylene chain, provided that both R3 and R4 cannot be hydrogen atoms at the same time;
- R5 is a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, a straight-chain, branched or cyclic haloalkyl group having 1 to 10 carbon atoms, or an aralkyl group;
- R6 is a hydrogen atom, a straight-chain or branched alkyl group having 1 to 4 carbon atoms, a straight-chain, branched or cyclic alkoxy group having 1 to 8 carbon atoms, a saturated heterocyclic oxy group, or a group of the formula:
- wherein R7 is a straight-chain, branched or cyclic alkyl group having 1 to 8 carbon atoms, an aryl group or a saturated heterocyclic group;
- X is a direct link;
- l is zero or an integer;
- k is zero or an integer;
- provided that 0.10≦(m+k)/(m+n+k)≦0.90 and 0≦k/(m+n+k)≦0.25,
- (b) a mixture of at least one compound of the formula:
- wherein R8 is a branched or cyclic alkyl group having 3 to 8 carbon atoms;
- and R9 is a straight-chain, branched or cyclic alkyl group having 1 to 8 carbon atoms, or an aralkyl group, and
- at least one compound selected from the group consisting of a compound of the formula:
- wherein R10, R11 and R12 are independently a hydrogen atom, a halogen atom, a straight-chain, branched or cyclic alkyl group having 1 to 6 carbon atoms, a straight-chain, branched or cyclic alkoxy group having 1 to 6 carbon atoms, or a phenylthio group:
- R13 is a 1-naphthyl group, a 2-naphthyl group, a 10-camphoryl group, a pyridyl group, or a group of the formula:
- wherein R14 and R15 are independently a hydrogen atom or a halogen atom;
- and R16 is a hydrogen atom, a halogen atom, a straight-chain, branched or cyclic alkyl group having 1 to 12 carbon atoms, a straight-chain or branched alkoxy group having 1 to 4 carbon atoms, and
- a compound of the formula:
- wherein R17 and R18 are independently a hydrogen atom, a straight-chain or branched alkyl group having 1 to 4 carbon atoms, a straight-chain or branched alkoxy group having 1 to 4 carbon atoms;
- and R19 is a 1-naphthyl group, a 2-naphthyl group, a 10-camphoryl group, a phenyl group, or a phenyl group substituted with one or more, the same or different, straight-chain, branched or cyclic alkyl groups having 1 to 12 carbon atoms, and
- (c) a solvent dissolving the components (a) and (b),
- wherein the component (c) is a mixed solvent containing a compound having a lactone ring.
Dependencies are inferred from the claim text.