Selective deposition of hydrous ruthenium oxide thin films

Abstract

A method for selectively depositing a film of hydrous ruthenium oxide on a substrate, the method comprising the steps of: selectively functionalizing a substrate surface; preparing an oxidizing aqueous solution of a Ru-containing composition; generating RuO4(g) from said oxidizing solution; selectively depositing a film of hydrous ruthenium oxide from said vapor of said oxidizing solution on said functionalized surface of said substrate; and depositing by autocatalysis hydrous ruthenium oxide from said vapor of said oxidizing solution on said previously deposited hydrous ruthenium oxide. RuO2.xH2O films are uniformly deposited on substrates that have been selectively surface-modified with or already contain the RuO4-reactive functional groups.

Dependencies are inferred from the claim text.