Method for compensating for nonuniform etch profiles
AssigneeLucent Technologies Inc.
InventorCristian A Bolle
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AssigneeLucent Technologies Inc.
InventorCristian A Bolle
Estimating the term…
Problems caused by a nonuniform processing profile are avoided by altering the area to be processed so as to compensate for the processing profile. More specifically, with regard to etching, problems caused by a nonuniform etch profile can be avoided by altering the mask employed in specifying the etch area so as to compensate for the etch profile. Nonuniform parameters of interest of structures which result from a nonuniform etch profile during the etching of a mask in which all the structures were identical can be avoided for by altering the mask employed in specifying the etch area so as to compensate for the etch profile. The mask is changed in a manner that is inversely proportional to the etch profile for each particular structure characteristic that determines the parameter of interest for which uniformity is desired.
A method for manufacturing an array of structures over a substrate, so that a parameter of interest for each of said structures is substantially identical, the method comprising the steps of:
An apparatus comprising a plurality of nonidentical structures, each of said structures being made up of at least one element, said at least one element of each of said plurality of nonidentical structures being intentionally different so as to make said nonidentical structures nonidentical by design, said nonidentical structures having at least one parameter of interest that is identical and is a function of an attribute of said element which makes said elements intentionally different.
A method for manufacturing an array of structures over a substrate, so that a parameter of interest for each of said structures varies over said substrate in accordance with a prescribed function, said prescribed function being different than any processing profile of materials used in any step of manufacturing said structure, the method comprising the steps of:
An apparatus comprising a plurality of nonidentical structures on a substrate each having a parameter of interest, said parameter of interest varying over said substrate in accordance with prescribed function which is different than any processing profile of materials used in any step of manufacturing said structure, each of said structures being made up of at least one element, said at least one element of each of said plurality of nonidentical structures being intentionally different so as to make said nonidentical structures nonidentical by design, said at least one parameter of interest being a function of an attribute of said element which makes said structures intentionally different.
Dependencies are inferred from the claim text.