Electrostatic charge-free solvent-type dryer for semiconductor wafers

A electrostatic charge-free solvent-type dryer for drying semiconductor wafers comprising:

• a tank body for holding a volume of water therein;
• a wafer carrier for holding a plurality of wafers therein;
• an elevator means for lowering and raising said wafer carrier into and out of said volume of water;
• a tank cover for covering an open top of said tank body forming a hermetically sealed cavity therein, said cover having a plurality of partition plates formed perpendicular to an interior surface of said cover extending downwardly into said tank cavity when said cover is mounted on said body;
• a conduit for feeding a flow of solvent vapor into said sealed cavity;
• a deionizing means for generating a flux of positive ions to neutralize negative ions in said flow of solvent vapor;
• and
• wherein at least one of said tank cover, said plurality of partition plates and said conduit is fabricated of a non-electrostatic material such that electrostatic charge is not generated in said flow of solvent vapor.