Liquid processing apparatus and method

A liquid processing method for performing a liquid processing by supplying a process liquid to the substrates held by a rotor capable of holding a plurality of substrates a predetermined distance apart from each other by using a liquid processing apparatus including:

• a fixed substantially cylindrical outside chamber;
• a substantially cylindrical inside chamber capable of being housed inside said outside chamber and slidable between a process position and a retreat position;
• and
• a cleaning mechanism for cleaning said inside chamber in its retreat position;
• said method comprising:
• a first step for applying a liquid processing to said substrates by using said inside chamber in its process position;
• a second step of applying a liquid processing to said substrates by using said outside chamber with said inside chamber by moving said inside chamber to its retreat position;
• and
• a third step of cleaning said inside chamber by said cleaning mechanism at a predetermined timing in its retreat position.

A liquid processing apparatus for performing a liquid processing by supplying a process liquid to the substrate, comprising:

• a rotor for holding a plurality of substrates a predetermined distance apart from each other and in parallel;
• a substantially cylindrical outside chamber capable of housing said rotor and fixed to a process position;
• a substantially cylindrical inside chamber capable of housing said rotor, and capable of being housed in said outside chamber;
• a cylindrical body capable of being housed in said inside chamber;
• a process liquid spurting nozzle for spurting a process liquid onto the substrate held by said rotor;
• a cleaning liquid spurting nozzle for spurting a cleaning liquid for cleaning said inside chamber;
• a first sliding mechanism capable of sliding said inside chamber among said process position, said retreat position, and a maintenance position remoter than said retreat position from said process position;
• a second sliding mechanism capable of sliding said cylindrical body between said retreat position and said maintenance position;
• a first seal mechanism mounted to one edge surface of said outside chamber in a manner to seal the clearance between said inside chamber and said outside chamber;
• and
• a second seal mechanism mounted to an edge surface of said inside chamber in a manner to seal the clearance between said cylindrical body and said inside chamber;
• wherein said inside chamber is slid between said process position and said maintenance position thereby being held at a predetermined position, and said cylindrical body is slid between said retreat position and said maintenance position thereby being held at a predetermined position, thereby gaining access easily to said first seal mechanism and said second seal mechanism.