Methods of operating semiconductor memory devices having split gate-type non-volatile memory cells
AssigneeSamsung Electronics Co., Ltd.
InventorJin-Woo Kim
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AssigneeSamsung Electronics Co., Ltd.
InventorJin-Woo Kim
Estimating the term…
Methods of operating non-volatile memory cells (e.g., EEPROM devices) include the use of negative substrate biases during programming and erasing operations. Theses methods include the step of erasing the memory cell by withdrawing negative charge from a floating gate therein using a positive control electrode bias and a negative substrate bias. The use of a negative substrate bias increases the potential difference between the control electrode and the floating gate and this increase results in faster and more reliable erasing. A step is also performed to program the memory cell by accumulating negative charge on the floating gate using a positive control electrode bias, a negative substrate bias and a positive drain bias. Here, the negative substrate bias is used advantageously to reduce the likelihood that non-selected memory cells will become inadvertently programmed during operations to program selected memory cells.
A method of operating a semiconductor memory device having split gate-type non-volatile memory cells including first electrodes respectively connected with a plurality of bit lines, control gates respectively connected with a plurality of word lines, and second electrodes connected with a common line, the method comprising the steps of:
A method of operating a semiconductor memory device having split gate-type non-volatile memory cells including first electrodes respectively connected with a plurality of bit lines, control gates respectively connected with a plurality of word lines, and second electrodes connected with a common line, the method comprising the steps of:
Dependencies are inferred from the claim text.