Projection exposure apparatus and device manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorsMasakatsu Ota, Naoto Sano
Life of this patent
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Abstract
A projection exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system for projecting the illuminated pattern onto a substrate, wherein the projection optical system includes a lens system being made of a substantially single glass material, a wavelength detecting device for detecting a wavelength of the laser light from the excimer laser and for producing an output, and a displacing device for shifting a mirror for resonance of the excimer laser, in an optical axis direction of the excimer laser, on the basis of the output of the wavelength detecting device.
Claims12
A projection exposure apparatus, comprising:
- an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser;
- a projection optical system for projecting the illuminated pattern onto a substrate, said projection optical system comprising a lens system being made of a substantially single glass material;
- wavelength detecting means for detecting a wavelength of the laser light from the excimer laser and for producing an output;
- and
- displacing means for shifting a mirror for resonance of the excimer laser, in an optical axis direction of the excimer laser, on the basis of the output of said wavelength detecting means.
A projection exposure apparatus, comprising:
- an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser;
- a projection optical system for projecting the illuminated pattern onto a substrate, said projection optical system being provided by a lens system substantially made of a single glass material;
- wavelength detecting means for detecting a wavelength of the laser light from the excimer laser and for producing an output;
- and
- pressure changing means for changing a pressure of a gas supplied to or to be supplied to a resonator of the excimer laser, on the basis of the output of said wavelength detecting means.
Dependencies are inferred from the claim text.